为研究激光诱导对二氧化钒光学性质的具体影响，采用磁控溅射技术制备了二氧化钒薄膜。利用原子力显微镜和X射线衍射仪对样品进行表征，发现其具有良好的平整度及致密均匀的结构，是纯相二氧化钒（M）薄膜，并且在透过率-温度变化曲线中观察到了典型的热滞回线。采用透/反射强度扫描系统研究了二氧化钒薄膜的光学特性，实验结果表明，在飞秒激光诱导下样品经历了非线性吸收过程、相变过程、稳态过程和损伤过程，非线性吸收过程由双光子吸收效应主导而相变过程与激光热效应息息相关。进一步研究发现，随着激光重复频率增加，增强的热效应导致其相变开启阈值和损伤阈值明显下降。

光谱波段和治疗光强度是光治疗的关键，决定了适应症、治疗深度和疗效。基于水滤红外线A原理，本文采用大功率高效卤素灯为光源，通过对光束整形、密闭液体过滤器以及电子学控制等系统设计了大功率光谱治疗仪，其基本性能与国外先进产品基本相同。该治疗仪的光谱、光功率密度、电气安全性和电磁兼容性通过了医疗器械注册检验，并应用于慢性软织损伤炎症、疼痛的临床治疗中。临床实验结果显示，71例患者在经过（6±1）天治疗后的总有效率达100%，显效率达80.28%，未发生不良反应。该治疗仪提升了有效光谱宽度和治疗光强度，降低了热效应，提高了穿透深度和疗效，有望广泛用于软组织的损伤、慢性炎症、疼痛及伤口愈合等领域。

Copper (Cu) nanoparticles (NPs) are synthesized under the near-surface region of the Nd:Y3Al5O12 (Nd:YAG) crystal by direct Cu+ ions implantation. Subsequently, the monolithic ridge waveguide with embedded Cu NPs is fabricated by C4+ ions irradiation and diamond saw dicing. The nonlinear optical response of the sample is investigated by the Z-scan technique, and pronounced saturable absorption is observed at the 1030 nm femtosecond laser. Based on the obvious saturable absorption of Cu NPs embedded Nd:YAG crystal, 1 μm monolithic mode-locked pulsed waveguide laser is implemented by evanescent field interaction between NPs and waveguide modes, reaching the pulse duration of 24.8 ps and repetition rate of 7.8 GHz. The work combines waveguides with NPs, achieving pulsed laser devices based on monolithic waveguide chips.

Mechanical exfoliation (ME) and chemical vapor deposition (CVD) MoS₂ monolayers have been extensively studied, but the large differences of nonlinear optical performance between them have never been clarified. Here, we prepared MoS₂ monolayers using ME and CVD methods and investigated the two-photon absorption (TPA) response and its saturation. We found that the TPA coefficient of the ME monolayer was about (1.88 ± 0.21) × 10³ cm/GW, nearly two times that of the CVD one at (1.04 ± 0.15) × 10³ cm/GW. Furthermore, we simulated and compared the TPA-induced optical pulse modulation in multilayer cascaded structures, which is instructive and meaningful for the design of optical devices such as a beam shaper and optical limiter.