近年来，随着大功率、高能量激光系统的不断发展，光学薄膜的抗激光能力成为制约激光系统高质量发展的瓶颈之一。基于不同的制备方法及工艺参数会对薄膜的损伤阈值产生重要的影响，就薄膜镀制前、镀制中以及镀制后三个方面对提高损伤阈值的方法进行综述，其中包括膜料优选、膜系设计、溶剂清洗、离子束清理、制备方法、离子束后处理、激光后处理等内容。

熔石英元件的抗激光损伤性能对高能激光器的稳定运行具有重要意义。为了提升熔石英元件抗激光损伤性能，针对传统氢氟酸蚀刻产生再沉积物的缺点，提出了采用有机氟酸蚀刻提升熔石英元件抗激光损伤性能的方法。有机氟酸蚀刻的优势在于产物具有较好的溶解性，因而产生再沉积物的可能性降低。采用有机氟酸溶液静态蚀刻熔石英元件，并对元件的表面质量、透过率和激光损伤密度进行了表征分析。表面质量和透过率的结果一致显示熔石英元件经有机氟酸蚀刻后，元件表面的再沉积物和污垢较少，表明有机氟酸具有较好的抑制再沉积物生成的效果。激光损伤密度结果显示，有机氟酸蚀刻熔石英的深度为6 μm时，元件的平均激光损伤密度为0.26 cm⁻²，接近先进缓释处理2（AMP2）工艺的水平。基于有机氟酸蚀刻提高熔石英元件的抗激光损伤性能为激光负载能力的提升开辟了一条新途径。

Transverse stimulated Raman scattering (TSRS) in potassium dihydrogen phosphate (KDP) and deuterated potassium dihydrogen phosphate (DKDP) plates for large-aperture, inertial confinement fusion (ICF)-class laser systems is a well-recognized limitation giving rise to parasitic energy conversion and laser-induced damage. The onset of TSRS is manifested in plates exposed to the ultraviolet section of the beam. TSRS amplification is a coherent process that grows exponentially and is distributed nonuniformly in the crystal and at the crystal surfaces. To understand the growth and spatial distribution of TSRS energy in various configurations, a modeling approach has been developed to simulate the operational conditions relevant to ICF-class laser systems. Specific aspects explored in this work include (i) the behavior of TSRS in large-aperture crystal plates suitable for third-harmonic generation and use as wave plates for polarization control in current-generation ICF-class laser system configurations; (ii) methods, and their limitations, of TSRS suppression and (iii) optimal geometries to guide future designs.

由于金属杂质离子对晶体损伤性质有不容忽视的影响，受实验条件限制，Fe及其团簇缺陷对晶体的影响机制尚不明确。采用第一性原理的方法，对磷酸二氢钾（KDP）和磷酸二氢铵（ADP）晶体中的Fe及其团簇缺陷进行模拟研究，确定其对晶体结构及光学性质方面的影响。研究发现，Fe进入KDP和ADP晶体中主要以取代P原子形成FeO₄基团最稳定，且其稳定形式以Fe³⁺为主。磁性状态研究发现磁性条件对晶体的结构和能量影响不大，Fe对晶体的损伤主要通过引起200～300 nm范围明显的光学吸收影响损伤阈值。Fe进入晶体中形成团簇缺陷可通过电荷补偿与O空位（V_O）复合，几乎不会与OH空位（V_OH）复合，团簇缺陷以Fe对晶体结构和性质的影响为主。

The laser-damage performance of optics is known to be negatively affected by microscale particle contamination induced by the operational environment. This work investigates the properties of particles accumulating in various locations near critical optics inside the OMEGA EP grating compressor chamber during quarterly operational periods over a 2-year duration. The particles found were characterized using optical microscopy, scanning electron microscopy and energy dispersive X-ray spectroscopy. The analysis indicates significant concentrations of micrometer- to nanometer-scale particles inside the vacuum chamber, with higher values observed near the port leading to the OMEGA EP target chamber. The distribution of the chemical composition of these particles varies between collection periods. Although understanding of the mechanisms of particle generation and transport remains uncertain, the hypothesis is that this particle load represents a risk for contaminating the surfaces of high-value optics located inside the chamber, including the compression gratings and deformable mirrors, and therefore affecting their laser-damage resistance and overall operational lifetime.