1 中国科学院上海光学精密机械研究所高功率激光物理重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
针对环形抛光中抛光盘的面形难以精确控制的问题, 以Preston方程和Winkler假定为基础, 建立光学元件抛光的基本模型, 通过理论分析和计算机模拟与实验, 深入研究环形抛光的系统特性。结果表明, 系统存在一个保持盘面面形不变的状态, 此时的状态为系统的平衡状态, 在平衡状态下抛光工件时无需调整校正板位置即可连续获得高精度平面; 在不同的工况下, 系统平衡状态对应的校正板位置不相同, 应用建立的模型定量研究平衡状态下校正板位置与工件尺寸的关系。实验证明在平衡状态下抛光工件时工件的面形精度和加工效率都得到了提高。
激光制造 环形抛光 平衡位置 面形变化速率 平衡状态 中国激光
2017, 44(11): 1102001
Author Affiliations
Abstract
1 Key Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
To establish the mechanism of surface change in a continuous polishing system, an ideal mathematical model is built based on Winkler’s hypothesis and the Preston equation. The basic features of the model are the change rates in the surface peak–valley (PV) values of the workpiece, conditioning disk and pitch lap, rather than the specific surface shapes. In addition, an equilibrium state exists in the system, indicating that the surface change rates are all zero. Under equilibrium, the surface of the lap could remain flat, and it is insensitive to the surface error of the workpiece. These characteristics lay the theoretical foundations for high-efficiency and high-precision polishing. The methods to obtain an equilibrium state with flat surfaces are then proposed and confirmed experimentally. High-precision surfaces better than λ/10 （λ=632.8 nm) are consistently produced experimentally.
continuous polishing continuous polishing equilibrium state equilibrium state high accuracy high accuracy high efficiency high efficiency surface figure control surface figure control High Power Laser Science and Engineering
2015, 3(2): 02000001
