Author Affiliations
Abstract
The blue phase, which emerges between cholesteric and isotropic phases within a three-dimensional periodical superstructure, is of great significance in display and photonic applications. The crystalline orientation plays an important role in the macroscopic performance of the blue phase, where the single crystal shows higher uniformity over the polydomain and monodomain, resulting in higher Bragg reflection intensity, lower hysteresis, and lower driving voltage. However, currently reported methods of forming a single-crystal blue phase based on thermal controlling or e-beam lithography are quite time-consuming or expensive for large-scale fabrication, especially in the centimeter range, thus hindering the broad practical applications of single-crystal blue-phase-based photonic devices. Herein, a strategy to fabricate a large scale single crystalline blue-phase domain using holography lithography is proposed. Defect-free single-crystal domains both in blue phase I and blue phase II with a desired orientation of over 1 cm2 are fabricated based on a nanopatterned grating with periodic homeotropic and degenerate parallel anchoring, with colors from red and green to blue. This holography lithography-assisted strategy for fabrication of a large-scale single-crystal blue phase provides a time-saving and low-cost method for a defect-free single crystalline structure, leading to broad applications in liquid crystal displays, laser devices, adaptive optics elements, and electro-optical devices.
blue phase single crystal holography lithography liquid crystals 
Advanced Photonics Nexus
2023, 2(2): 026004
作者单位
摘要
1 长春理工大学 理学院, 吉林 长春 130022
2 吉林农业大学 信息技术学院, 吉林 长春 130018
利用全息光刻开展了808 nm腔面光栅半导体激光器腔面膜系制备, 制备与表征了单管芯器件, 单管芯器件条宽100 μm, 腔长2 mm, 输出中心波长807.32 nm, 光谱半宽为0.36 nm, 15~45 ℃温度范围内波长随温度的漂移系数为0.072 nm/℃, 室温单管芯最大连续输出功率达到2.8 W, 阈值电流为0.49 A, 斜率效率为1.05 W/A。测试结果表明808 nm腔面光栅半导体激光器实现了单纵模输出。
半导体激光器 波长锁定 腔面光栅 全息光刻 semiconductor laser wavelength locking facet grating holography lithography 
发光学报
2019, 40(9): 1130
作者单位
摘要
中国科学技术大学国家同步辐射实验室,安徽合肥 230029
针对等离子体诊断及空间环境探测等领域对软X射线透射光栅的需要,采用全息光刻和微电镀技术制作了自支撑软X射线金透射光栅。在基底与光刻胶之间增加减反膜层以降低高反射基底引起的驻波效应对掩模槽形的影响,使用全息光刻技术获得了侧壁陡直的光栅掩模。然后,在掩模顶部镀保护层并使用反应离子刻蚀获得电镀掩模,通过改变保护层厚度来调节电镀掩模的占宽比。最后,利用微电镀技术沉积金,成功制作了线条密度为3 450 gr/mm的自支撑透射光栅,光栅周期约为290 nm,占宽比为0.55,金吸收体为500 nm,光栅尺寸达到10 mm×15 mm。在国家同步辐射装置上,测得在5~12 nm软X射线波段其+1级透射衍射效率约为5%。
自支撑金透射光栅 全息光刻 电镀 self-supported gold transmission grating holography lithography plating 
光学 精密工程
2011, 19(11): 2589

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