系统地研究了随着GaSb薄膜生长温度的降低, Sb/Ga(V/III)比的变化对薄膜低缺陷表面质量的影响.为了获得良好表面形貌的GaSb外延层, 生长温度与V/III比均需要同时降低.当Sb源裂解温度为900℃时, 生长得到低缺陷表面的低温GaSb薄膜的最佳生长条件是生长温度为在再构温度的基础上加60℃且V/III比为7.1.

The influence on the low-defect surface of GaSb thin-film material by the ratio of Sb to Ga (V/III) along with the reducing of the growth temperature was investigated systematically. In order to obtain a good surface morphology of the GaSb epitaxial layer with low defect, both of the growth temperature and the V/III ratio should be reduced at the same time. The optimal growth conditions of Low-temperature GaSb thin films are that the growth temperature is Tc+60℃ and the V/III ratio is about 7.1 when Sb cracker temperature is 900℃.