激光与光电子学进展, 2018, 55 (3): 033101, 网络出版: 2018-09-10
基于原子层沉积的大曲率基底表面薄膜均匀性研究 下载: 1217次
Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition
引用该论文
来邻, 李旸晖, 周辉, 夏浩盛, 刘小煜, 夏成樑, 王乐. 基于原子层沉积的大曲率基底表面薄膜均匀性研究[J]. 激光与光电子学进展, 2018, 55(3): 033101.
Lin Lai, Yanghui Li, Hui Zhou, Haosheng Xia, Xiaoyu Liu, Chengliang Xia, Le Wang. Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition[J]. Laser & Optoelectronics Progress, 2018, 55(3): 033101.
来邻, 李旸晖, 周辉, 夏浩盛, 刘小煜, 夏成樑, 王乐. 基于原子层沉积的大曲率基底表面薄膜均匀性研究[J]. 激光与光电子学进展, 2018, 55(3): 033101. Lin Lai, Yanghui Li, Hui Zhou, Haosheng Xia, Xiaoyu Liu, Chengliang Xia, Le Wang. Study of Film Uniformity on Large-Curvature Substrate Surface Based on Atomic Layer Deposition[J]. Laser & Optoelectronics Progress, 2018, 55(3): 033101.