发光学报, 2019, 40 (9): 1130, 网络出版: 2019-09-27
全息光刻制备808 nm腔面光栅半导体激光器
808 nm Cavity Surface Grating Semiconductor Laser by Holographic Lithography
图 & 表
王岳, 王勇, 李占国, 尤明慧. 全息光刻制备808 nm腔面光栅半导体激光器[J]. 发光学报, 2019, 40(9): 1130. WANG Yue, WANG Yong, LI Zhan-guo, YOU Ming-hui. 808 nm Cavity Surface Grating Semiconductor Laser by Holographic Lithography[J]. Chinese Journal of Luminescence, 2019, 40(9): 1130.