红外与激光工程, 2005, 34 (5): 544, 网络出版: 2006-05-25  

GaN外延膜的红外椭偏光谱研究

GaN epilayer by infrared spectroscopic ellipsometry
作者单位
1 中国科学院上海技术物理研究所,传感技术国家重点实验室,上海,200083
2 山东大学,信息科学与工程学院,山东,济南,250100
3 中国科学院上海技术物理研究所,红外物理国家重点实验室,上海,200083
引用该论文

王静, 李向阳, 刘骥, 黄志明. GaN外延膜的红外椭偏光谱研究[J]. 红外与激光工程, 2005, 34(5): 544.

王静, 李向阳, 刘骥, 黄志明. GaN epilayer by infrared spectroscopic ellipsometry[J]. Infrared and Laser Engineering, 2005, 34(5): 544.

参考文献

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王静, 李向阳, 刘骥, 黄志明. GaN外延膜的红外椭偏光谱研究[J]. 红外与激光工程, 2005, 34(5): 544. 王静, 李向阳, 刘骥, 黄志明. GaN epilayer by infrared spectroscopic ellipsometry[J]. Infrared and Laser Engineering, 2005, 34(5): 544.

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