改性剂对旋转法SiO2减反膜均匀性的影响
杨伟, 李海波, 张清华, 马红菊, 惠浩浩, 刘志超, 马平. 改性剂对旋转法SiO2减反膜均匀性的影响[J]. 强激光与粒子束, 2010, 22(12): 2865.
Yang Wei, Li Haibo, Zhang Qinghua, Ma Hongju, Hui Haohao, Liu Zhichao, Ma Ping. Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films[J]. High Power Laser and Particle Beams, 2010, 22(12): 2865.
[2] Suratwala T, Carman L, Thomas I. NIF anti-reflective coating solutions: preparation, procedures and specifications[R]. UCR-ID-154-626, 2003.
[3] Kozuka H, Hirano M. Radiative striations and surface roughness of alkoxide-derived spin coating films[J]. Journal of Sol-Gel Science and Technology, 2000, 19(1-3):501-504.
[4] Daniels B K, Szmanda C R, Templeton M K, et al. Surface tension effects in microlithography-striations[C]//Proc of SPIE. 1986, 631:192-201.
[5] Birnie D P Ⅲ. Rational solvent selection strategies to combat striation formation during spin coating of thin films[J]. J Mater Res, 2001, 16(4):1145-1154.
[6] Birnie D P Ⅲ, Kaz D M, Talor D J. Surface tension evolution during early stages of drying of sol-gel coatings[J]. Journal of Sol-Gel Science and Technology, 2009, 49(2):233-237.
[7] Kozuka H, Ishikawa Y, Ashibe N. Radiative striations of spin-coating films: surface roughness measurement and in-situ observation[J]. Journal of Sol-Gel Science and Technology, 2004, 31(1-3):245-248.
[8] Strawhecker K E, Kumar S K. The critical role of solvent evaporation on the roughness of spin-cast polymer films[J]. Macromolecules, 2001, 34(14):4669-4672.
[9] Du Xinmin, Orignac X, Almeida R M. Striation-free, spin-coated sol-gel optical films[J]. J Am Ceram Soc, 1995, 78(8):2254-2256.
[10] Stber W, Fink A, Bohn E. Controlled growth of monodisperse silica spheres in the micro size range[J]. J Colloid Interface Sci, 1968, 26(1):62-66.
[11] Bornside D E, Macosko C W, Scriven L E. On the modelling of spin coating[J]. Journal of Imaging Technology, 1987, 13:122-130.
[12] 汤加苗, 朱从善, 夏海平,等.PEG对SiO2溶胶-凝胶中颗粒度分布和孔结构的影响[J].材料研究学报, 1998, 12(1):79-82.(Tang Jiamiao, Zhu Congshan, Xia Haiping, et al. Effect of PEG on partical distribution and pore structure in silica sol and gel. Chinese Journal of Material Research, 1998, 12(1):79-82)
[14] Floch H G. Sol-gel broadband antireflective coating for advanced laser-glass amplifiers[C]//Proc of SPIE. 1994, 2288:14-24.
杨伟, 李海波, 张清华, 马红菊, 惠浩浩, 刘志超, 马平. 改性剂对旋转法SiO2减反膜均匀性的影响[J]. 强激光与粒子束, 2010, 22(12): 2865. Yang Wei, Li Haibo, Zhang Qinghua, Ma Hongju, Hui Haohao, Liu Zhichao, Ma Ping. Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films[J]. High Power Laser and Particle Beams, 2010, 22(12): 2865.