强激光与粒子束, 2010, 22 (12): 2865, 网络出版: 2011-01-05
改性剂对旋转法SiO2减反膜均匀性的影响
Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films
图 & 表
杨伟, 李海波, 张清华, 马红菊, 惠浩浩, 刘志超, 马平. 改性剂对旋转法SiO2减反膜均匀性的影响[J]. 强激光与粒子束, 2010, 22(12): 2865. Yang Wei, Li Haibo, Zhang Qinghua, Ma Hongju, Hui Haohao, Liu Zhichao, Ma Ping. Effect of modifiers on uniformity of spin-coated sol-gel silica antireflective films[J]. High Power Laser and Particle Beams, 2010, 22(12): 2865.