基于离子束溅射大口径光学元件平坦化层均匀性研究

针对大口径光学元件溅射沉积膜厚不均匀的问题, 采用离子束溅射平坦化层来改善光学元件表面粗糙度.利用膜厚检测仪测出光学元件沉积面上的中心区域以及各边缘区域的膜厚值, 计算离子束在光学元件中心与边缘驻留时间比, 并通过MATLAB拟合驻留时间分布规律, 根据所得的数据进行逐级修正.实验结果表明, 当驻留时间比优化为-26.6%时, 可以实现在直径300~600 mm大口径的光学元件上均匀镀膜, 以熔石英表面上镀硅膜为例, 溅射沉积6 h, 表面膜厚为212.4±0.3 nm, 薄膜均匀性达到0.4%.

Abstract

Aiming at the problem that nonuniform thickness of sputter deposited film on large-caliber optical components, the ion beam sputtering planarization layer was used to improve the surface roughness of the optical elements. The film thickness of the center and edge of optical elements depositing surface was measured by the film thickness detector, and the dwell time ratio of the center to edge was calculated. The dwell time distribution was fitted by MATLAB, and the value was corrected by the obtained data step by step. The experimental results show that, when the dwell time ratio is revised to -26.6%, uniform film can be achieved on optical elements with a diameter of 300~600 mm. Taking a Si film on the surface of fused silica as an example, the experiment is carried out for 6 h, the film thickness is 212.4±0.3 nm, and the film uniformity can reach up to 0.4%.

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冯时, 付秀华, 王大森, 李晓静, 聂凤明, 张旭. 基于离子束溅射大口径光学元件平坦化层均匀性研究[J]. 光子学报, 2019, 48(1): 0131002. FENG Shi, FU Xiu-hua, WANG Da-sen, LI Xiao-jing, NIE Feng-ming, ZHANG Xu. Study on Planarization Layer Uniformity of Large-aperture Optical Elements Based on Ion Beam Sputtering[J]. ACTA PHOTONICA SINICA, 2019, 48(1): 0131002.

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