界面连续性对薄膜节瘤损伤特性的影响

研究了HfO2/SiO2高反膜中植入2 μm的SiO2小球所形成的节瘤的界面连续性对损伤特性的影响。采用离子束辅助沉积(IAD)技术制备了两种不同厚度的1064 nm高反膜。它们的电场分布和吸收相近；但是厚度大(约为2倍)的薄膜中，节瘤的界面连续性更好。对于这两种特性的节瘤，用1064 nm脉冲激光(脉宽10 ns)进行了统计性的Raster Scan扫描测量。发现厚度大的薄膜中节瘤的初始损伤阈值更高(约为2倍)，损伤过程相对缓慢。说明对于2 μm直径的SiO2种子源，在考察的厚度范围内，节瘤与周围膜层的连续性随着膜层厚度的增加明显改善，其抗激光辐照的稳定性也增强，初始损伤阈值随之提高。

Abstract

The influence of interface-continuity of nodules that initiate from 2 μm SiO2 particles on the damaging behaviors of HfO2/SiO2 high reflective coatings is discussed. Two kinds of films with different thickness are manufactured using ion-assistant deposition (IAD) technique. These films have similar distribution of electronic field and absorption; however, the film with larger thickness (double times) has better interface-continuity. The two kinds of films with engineered defects are irradiated by the 1064 nm(10 ns) laser pulse in the way of raster scan. It is found that the nodules in thicker films had higher initial damage threshold and the damage process is relatively slower. It is shown that for the SiO2 particle with diameter of 2 μm, the continuity of the interface between the nodular defects and surrounding layers become better with the increasing film’s thickness, and its resistance to the laser-irradiation also increased.

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何文彦, 程鑫彬, 马彬, 丁涛, 叶晓雯, 张锦龙, 张艳云, 焦宏飞, 王占山. 界面连续性对薄膜节瘤损伤特性的影响[J]. 中国激光, 2011, 38(s1): s107002. He Wenyan, Cheng Xinbin, Ma Bin, Ding Tao, Ye Xiaowen, Zhang Jinlong, Zhang Yanyun, Jiao Hongfeng, Wang Zhanshan. Influence of the Interface-Continuity on the Damaging Characteristics of Nodular Defects[J]. Chinese Journal of Lasers, 2011, 38(s1): s107002.

界面连续性对薄膜节瘤损伤特性的影响

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