光学学报, 2011, 31 (12): 1222007, 网络出版: 2011-11-21
背向曝光表面等离子体激元干涉光刻系统中银层超透镜的优化设计
Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique
补充材料
肖啸, 张志友, 何明阳, 肖志刚, 许德富. 背向曝光表面等离子体激元干涉光刻系统中银层超透镜的优化设计[J]. 光学学报, 2011, 31(12): 1222007. Xiao Xiao, Zhang Zhiyou, He Mingyang, Xiao Zhigang, Xu Defu. Optimized Design of Silver Superlens for the Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique[J]. Acta Optica Sinica, 2011, 31(12): 1222007.
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