张宇晖 1,2,3王胭脂 1,3,4陈瑞溢 1,2,3王志皓 1,2,3[ ... ]邵建达 1,3,4
1 中国科学院上海光学精密机械研究所薄膜光学实验室, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
4 中国科学院超强激光科学卓越创新中心, 上海 201800
5 中国科学院上海光学精密机械研究所强场激光物理国家重点实验室, 上海 201800
宽带高损伤阈值低色散镜是拍瓦激光系统中不可或缺的光学元件。系统性地研究了金属-介质镜、介质镜和组合介质镜的光学性能、色散特性、抗损伤特性以及损伤机理。介质膜能够提高金属膜的损伤阈值,银-介质低色散镜的传输效率和损伤阈值比Au、Al更高;在飞秒激光作用下,金属-介质镜在近损伤阈值处为典型的鼓包形貌,这是由于金属层吸收了大量能量而产生了热应力破坏。在组合介质镜中,保护层HfO2的存在降低了Ta2O5中的电场,初始损伤层被转移至HfO2中,且在不牺牲反射带宽和色散性能的前提下介质膜的损伤阈值得到了提升。
薄膜 低色散镜 反射膜 损伤阈值 拍瓦激光系统 中国激光
2020, 47(11): 1103001
Author Affiliations
Abstract
1 Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
3 Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai 201800, China
4 Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
Ultrathin Ge films with thickness of about 15 nm at different deposition temperatures were prepared by electron beam evaporation. Spectral measurement results showed that as the deposition temperature increased from 100°C to 300°C, the transmittance of the films in the wavelength range from 350 nm to 2100 nm decreased. After annealing in air at 500°C, the transmittance significantly increased and approached that of uncoated fused quartz. Based on the Tauc plot method and Mott–Davis–Paracrystalline model, the optical band gap of Ge films was calculated and interpreted. The difference in optical band gap reveals that the deposition temperature has an effect on the optical band gap before annealing, while having little effect on the optical band gap after annealing. Furthermore, due to oxidation of Ge films, the optical band gap was significantly increased to ～5.7 eV after annealing.
Ge films transmittance optical band gap deposition temperature annealing Chinese Optics Letters
2020, 18(10): 103101
1 中国科学院上海光学精密机械研究所精密光学制造与检测中心, 上海 201800
2 中国科学院大学材料与光电研究中心, 北京 100049
3 中国科学院上海光学精密机械研究所薄膜光学实验室, 上海 201800
利用时间分辨激光光度计实时测量纳秒脉冲激光诱导熔石英体损伤过程中的透射、反射和散射变化量;通过在同一区域多次动态测量直至损伤产生,获得了多脉冲累积破坏的时间分辨过程。结果表明:在损伤出现前的脉冲辐照过程中,熔石英透过率已明显下降,后向反射率同步上升,甚至可达70%;后向反射率的上升量与透过率的损失量几乎相同;在多脉冲辐照过程中,只要脉冲辐照中出现后向反射,就会产生损伤;受激布里渊散射对多脉冲诱导熔石英体损伤具有促进作用。
激光光学 激光损伤 激光材料 光学性质 熔石英
Author Affiliations
Abstract
1 Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
3 Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
A time-resolved high-power laser photometer, which measures the real-time variations of transmission, internal reflection, and scattering simultaneously with picosecond time resolution, was developed to investigate the material response sequence during high-power nanosecond laser irradiation in thick fused silica. It was found that the transient transmission decreased sharply, accompanied by an increase in internal reflection at the rising edge of the laser pulse. The transient transmission recovered, while laser damage did not occur, but it did not recover if the scattering increased, indicating the occurrence of laser damage. The reason for the sharp decrease of transmission and the relationship between the transmission drop and laser damage were discussed.
160.4760 Optical properties 140.3330 Laser damage 160.3380 Laser materials Chinese Optics Letters
2019, 17(5): 051601
Author Affiliations
Abstract
1 Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
Complementary analysis techniques are applied in this work to study the interface structure of Mo/Si multilayers. The samples are characterized by grazing incident x-ray reflectivity, x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, and extreme ultraviolet reflectivity. The results indicate that the layer thickness is controlled well with small diffusion on the interface by forming MoSi2. Considering MoSi2 as the interface composition, simulating the result of our four-layer model fits well with the measured reflectivity curve at 13.5 nm.
340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV) 230.4170 Multilayers Chinese Optics Letters
2016, 14(8): 083401
1 中国科学院上海光学精密机械研究所强激光重点材料实验室, 上海 201800
2 中国科学院大学, 北京 100049
用脉冲直流磁控溅射方法在硅片衬底上制备了厚度相同的单层钼薄膜，结合台阶仪、X射线衍射仪、场发射扫描电镜、原子力学显微镜和紫外-可见分光光度计分别研究了不同沉积速率对钼薄膜微结构、表面形貌和光学性能的影响。掠入射X射线反射谱拟合的钼薄膜厚度与设计厚度一致，说明当前钼薄膜制备工艺成熟稳定。沉积速率通过改变薄膜生长模式与薄膜形核率影响钼薄膜表面形貌演化。随着沉积速率的增大，薄膜越来越致密，钼(110)面的衍射峰强度逐渐增大，平均晶粒尺寸增大, 表面粗糙度先降低后增加。
薄膜 光学性能 材料制备与表征 其他性能
1 中国科学院上海光学精密机械研究所, 上海 201800
2 中国科学院大学, 北京 100049
提出了一种基于椭偏成像光路和表面等离子体共振效应的金属薄膜参数测量方法，在椭偏成像光路中采用p偏振光在金属薄膜与空气界面产生表面等离子体共振效应，利用不产生表面等离子体共振效应的s偏振光消除背景光的影响，得到表面等离子体共振吸收环垂直方向的归一化反射率曲线，数值拟合获得待测金属薄膜的薄膜参数，这种方法不需要求解椭偏方程，数据处理过程简单，求解速度快。实验中，基于该方法的测量结果与标准椭偏仪的测量结果基本一致，很好地验证了该方法的有效性。
测量 金属薄膜参数 表面等离子体共振效应 椭偏成像光路 中国激光
2015, 42(11): 1108001
1 中国科学院 上海光学精密机械研究所, 强激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
3 中国工程物理研究院 上海激光等离子体所, 上海 201800
采用多光束应力实时测量装置监控并分析了磁控溅射Si和SiNx薄膜的总力及应力演化过程。在两种膜层中均观察到了应力释放及恢复现象。Si膜中应力是可逆的，而SiNx膜中应力是部分可逆的。物理吸附和解吸附分别是应力释放和恢复的主要原因。不可逆的应力分量来源于化学吸附，基于吸附机制建立了一个应力释放模型。
应力释放 应力恢复 物理吸附 化学吸附 stress relaxation stress recovery physical adsorption chemical adsorption 强激光与粒子束
2013, 25(11): 2826
1 中国科学院 上海光学精密机械研究所, 强激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
研制了四种不同沥青和松香含量的光学沥青抛光胶，对其形貌、针入度、玻璃化转变温度、软化点和粘度等参量进行了表征。从组成和结构分析了抛光胶三种物理状态变化原因，将玻璃化转变温度和软化点作为其临界转变温度。实验研究了四种抛光胶对大口径激光玻璃的抛光效果，发现抛光胶中沥青和松香的质量分数分别为30%和70%时，抛光效果比较理想，在像散和表面疵病控制方面能够满足要求，可作为大口径激光玻璃抛光专用胶。
大口径激光玻璃 环抛 光学沥青抛光胶 像散 large-aperture laser glass continuous polishing optical polishing pitch astigmatism
1 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
用电子束蒸发技术在K9玻璃及YAG晶体上沉积了HfO2/SiO2多层膜，采用纳米划痕仪对薄膜的力学性能进行了研究。实验结果表明：沉积在YAG和K9的多层膜弹性模量分别为34.8 GPa和38.5 GPa, 基底对薄膜的弹性模量影响较小；YAG和K9上薄膜的粘附失效临界附着力分别为5 mN和7 mN，薄膜与YAG基底的结合状态较K9基底的差，并且呈现不同破坏模式。从薄膜之间及膜基界面处的界面结合状态和弹性模量两方面分析解释了YAG基底和K9基底上薄膜的不同力学行为。
薄膜 HfO2/SiO2多层膜 YAG晶体 K9玻璃 力学性能
