强激光与粒子束, 2011, 23 (2): 428, 网络出版: 2011-03-02
制备铋靶的脉冲电镀工艺
Pulse electroplating in bismuth target fabrication
图 & 表
张红强, 戴亚堂, 张欢, 夏姣. 制备铋靶的脉冲电镀工艺[J]. 强激光与粒子束, 2011, 23(2): 428. Zhang Hongqiang, Dai Yatang, Zhang Huan, Xia Jiao. Pulse electroplating in bismuth target fabrication[J]. High Power Laser and Particle Beams, 2011, 23(2): 428.