光学学报, 2018, 38 (9): 0912002, 网络出版: 2019-05-09
浸没式光刻机对焦控制技术研究 
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Focus Control Technology in Immersion Lithography
图 & 表
图 2. 浸没式光刻机对焦控制系统架构示意图
Fig. 2. Schematic of focus control system architecture of immersion lithography machine
图 3. 对焦误差分布及分解示意图。(a)总误差;(b)焦距偏移误差;(c) y方向倾斜误差Ry;(d) x方向倾斜误差Rx;(e) y方向场曲误差Cy;(f) x方向场曲误差Cx;(g)沟槽型误差;(h)起伏型误差;(i)线性横摇误差;(j)扭曲误差
Fig. 3. Focus error distribution and decomposition diagrams. (a) Total error; (b) focal length offset error; (c) y direction tilt error Ry; (d) x direction tilt error Rx; (e) y direction field curvature error Cy; (f) x direction field curvature error Cx; (g) groove type error; (h) undulating type error; (i) linear yaw error; (j) distortion error
图 4. 由y方向倾斜误差Ry造成的z向误差的仿真流程图
Fig. 4. Simulation flow chart of z direction error caused by y direction tilt error Ry
图 5. 非正态分布误差造成的z向误差分布。(a) y方向倾斜误差Ry;(b) x方向倾斜误差Rx;(c) y方向场曲误差Cy;(d) x方向场曲误差Cx;(e)扭曲误差;(f)线性横摇误差
Fig. 5. z-direction error distribution caused by non-normal distribution errors. (a) y direction tilt error Ry;(b) x direction tilt error Rx; (c) y direction field curvature error Cy; (d) x direction field curvature error Cx; (e) distortion error; (f) linear yaw error
图 6. 所有误差源造成的z向(对焦)误差相加后的总误差在一个曝光场上的分布
Fig. 6. Distribution of the total error of z-direction (focus) errors caused by all sources of error on one exposure field
表 1不同IC技术节点中浸没光刻工艺的总对焦成功率
Table1. Total focusing success rate of immersion lithography technology at various IC technology nodes
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段晨, 宗明成, 范伟, 孟璐璐. 浸没式光刻机对焦控制技术研究[J]. 光学学报, 2018, 38(9): 0912002. Chen Duan, Mingcheng Zong, Wei Fan, Lulu Meng. Focus Control Technology in Immersion Lithography[J]. Acta Optica Sinica, 2018, 38(9): 0912002.
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