光学学报, 2017, 37 (10): 1022001, 网络出版: 2018-09-07
基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法 
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Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm
图 & 表
图 3. 投影物镜光瞳相位分布图。(a) z4;(b) z9;(c) z16;(d) z25;(e) z36;(f)拟合的投影物镜光瞳
Fig. 3. Projector pupil phase distribution. (a) z4; (b) z9; (c) z16; (d) z25; (e) z36; (f) fitting projector pupil
图 4. 基于PSO算法的SMPO方法流程图。(a)总流程图;(b)子流程图
Fig. 4. Flowcharts of SMPO method using PSO algorithm. (a) General flowchart; (b) sub-flowcharts
图 5. 标称条件下(a)初始光源;(b)初始掩模;(c)初始投影物镜光瞳;(d)初始光刻胶像
Fig. 5. (a) Initial source; (b) initial mask; (c) initial projector pupil; (d) initial photoresist image in nominal condition
图 6. 标称条件下(a)优化后光源;(b)优化后掩模;(c)优化后投影物镜光瞳;(d)优化后光刻胶像
Fig. 6. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in nominal condition
图 8. 工艺条件下(a)初始投影物镜光瞳;(b)初始光刻胶像
Fig. 8. (a) Initial projector pupil; (b) initial photoresist image in process condition
图 9. 工艺条件下(a)优化后光源;(b)优化后掩模;(c)优化后投影物镜光瞳;(d)优化后光刻胶像
Fig. 9. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image in process condition
图 11. 基于PSO算法的SMO方法的优化结果。(a)优化后光源;(b)优化后掩模;(c)优化后光刻胶像;(d)收敛曲线
Fig. 11. Optimal results of SMO method based on PSO algorithm. (a) Optimized source; (b) optimized mask; (c) optimized photoresist image; (d) convergence curve
图 12. 未进行掩模图形数据压缩下的优化结果。(a)优化后光源;(b)优化后掩模;(c)优化后投影物镜光瞳;(d)优化后光刻胶像
Fig. 12. Optimal results without data compression of the mask pattern. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized resist image
图 13. 基于遗传算法的SMPO方法的优化结果。(a)优化后光源;(b)优化后掩模;(c)优化后投影物镜光瞳;(d)优化后光刻胶像
Fig. 13. Optimal results of SMPO method based on genetic algorithm. (a) Optimized source; (b) optimized mask; (c) optimized projector pupil; (d) optimized photoresist image
王磊, 李思坤, 王向朝, 杨朝兴. 基于粒子群优化算法的光刻机光源掩模投影物镜联合优化方法[J]. 光学学报, 2017, 37(10): 1022001. Lei Wang, Sikun Li, Xiangzhao Wang, Chaoxing Yang. Source Mask Projector Optimization Method of Lithography Tools Based on Particle Swarm Optimization Algorithm[J]. Acta Optica Sinica, 2017, 37(10): 1022001.
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