用于光学位移传感器的新型数字编码光栅尺的制作

王宇; 陈火耀; 刘正坤; 郑衍畅; 洪义麟; 付绍军

doi:doi:10.3788/gzxb20154404.0405001

光子学报, 2015, 44 (4): 0405001, 网络出版: 2015-04-28

用于光学位移传感器的新型数字编码光栅尺的制作

Fabrication Process of a Novel Digital Encoding Grating Ruler for Optical Displacement Sensors

论文大纲

王宇 ^*陈火耀刘正坤郑衍畅洪义麟付绍军

作者单位

中国科学技术大学国家同步辐射实验室, 合肥 230029

摘要

介绍了数字编码光栅尺的结构设计并提出一种制作方法.采用紫外对准光刻、全息光刻及湿法腐蚀结合在(100)硅片上制作母光栅尺, 并以具有紫外固化特性的聚氨酯丙烯酸酯为材料, 将母光栅尺复制到硬基底上.实验表明, 该工艺可重复性高, 复制光栅尺的衍射效率高于母光栅尺的90%, 并能承受航空环境－55℃~70℃的高低温冲击.光栅尺的制作准确度满足传感器的要求, 信号响应准确率100%.该方法可对具有准确度高、图形复杂、工作环境恶劣等特点的微纳米结构的制作提供借鉴.

Abstract

The structure and fabrication process of a novel Digital Encoding Grating Ruler (DEGR)were introduced.In this process, the pattern of DEGR is firstly fabricated on a (100) silicon wafer by combining UV lithography and holography lithography with wet etch technique, and then replicated to a hard substrate using polyurethane acrylate which is UV curable. Experimental results show that the process is highly repeatable. The replicated gratings work properly in the ambient temperature ranging from －55℃ to 70℃, and its diffraction efficiency is higher than 90% of the master one. The fabrication precision meets the requirements of the optical sensor, and the signal response accuracy is 100%. Moreover, this process could be used to fabricate other micro-nanometer structures with high precision, complex pattern and poor working environment.

参考文献

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王宇, 陈火耀, 刘正坤, 郑衍畅, 洪义麟, 付绍军. 用于光学位移传感器的新型数字编码光栅尺的制作[J]. 光子学报, 2015, 44(4): 0405001. WANG Yu, CHEN Huo-yao, LIU Zheng-kun, ZHENG Yan-chang, HONG Yi-lin, FU Shao-jun. Fabrication Process of a Novel Digital Encoding Grating Ruler for Optical Displacement Sensors[J]. ACTA PHOTONICA SINICA, 2015, 44(4): 0405001.

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