针对拼接干涉测量技术除了引入拼接误差,还将引入机械运动误差的问题,为此提出一种X射线反射镜的非零位干涉测量方法,无需拼接便可实现零回程误差的高精度干涉测量。利用一块高精度平面镜来标定干涉系统在全视场范围内的回程误差。通过将待测非球面镜划分成多个子孔径,每个子孔径可近似看作一个平面,这样可以从标定数据库中找到该子孔径所对应的回程误差,通过简单的矩阵拼接可得到整个待测非球面镜的回程误差。以X射线椭圆柱面反射镜为例进行实验,实现X射线椭圆柱面反射镜非零位干涉测量面形的回程误差有效标定,相比于拼接干涉测量方法二者结果一致性较好,证实所提方法的正确性。

A four-channel Kirkpatrick–Baez microscope working at multiple energy bands is developed for multiframe X-ray imaging diagnostics at the Shenguang-II laser facility. The response to the multiple energy bands is realized by coating the double-periodic multilayers on the reflected surfaces of the microscope. Because of the limited size of the microstrips in the X-ray framing camera, the image separation is controlled by the conical angle of the reference cores during microscope assembly. This study describes the optical and multilayer design, assembly, and alignment of the developed microscope. The microscope achieves a spatial resolution of 4–5 mm in the laboratory and 10–20 mm at Shenguang-II laser facility within a 300 mm field of view. The versatile nature of the developed microscope enables the multiple microscopes currently installed in the laser facility to be replaced with a single, multipurpose microscope.

A time-resolved multispectral X-ray imaging approach with new version of multi-channel Kirkpatrick-Baez (KB) microscope is developed for laser plasma diagnostics at the kilojoule-class Shenguang-II laser facility (SG-II). The microscope uses a total external reflection mirror in the sagittal direction and an array of multilayer mirrors in the tangential direction to obtain multiple individual high-resolution, highthroughput, and quasi-monochromatic X-ray images. The time evolution of the imploded target in multiple X-ray energy bands can be acquired when coupled with an X-ray streak camera. The experimental result of the time-resolved 2.5 and 3.0 keV dual-spectral self-emission imaging of the undoped CH shell target on SG-II is given.

The direct replication of W/Si supermirrors is investigated systematically. W/Si supermirrors are fabricated by direct current (DC) magnetron sputtering technology. After deposition, the supermirrors are replicated from the supersmooth mandrels onto ordinary °oat glass substrates by epoxy replication technique. The properties of the supermirrors before and after the replication are characterized by grazing incidence X-ray reflectometry (GIXR) measurement and atomic force microscope (AFM). The results show that before and after replication, the multilayer structures are almost the same and that the surface roughness is 0.240 and 0.217 nm, respectively, which are close to that of the mandrel. It is demonstrated that the W/Si supermirrors are successfully replicated from the mandrel with good performance.

A fine layer structure in the Ni/C multilayer (3-4 nm/6-7 nm) is deposited by magnetic sputtering by combining soft X-ray resonant reflectivity curve at 4.48 nm and grazing incidence X-ray reflectivity (GIXR) curve at 0.14 nm. It is found that the thickness of Ni-on-C interface is much rougher than C-on-Ni interface. By analyzing the optical constants, it shows that the interface in the Ni/C multilayer that of system is a mixture of Ni and C atoms; the Ni and C in multilayer system have excellent stability, and no interlayer is formed.

The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of efficient coatings. The development of novel coatings with improved EUV performance is presented. An extensive research was performed on the search and characterization of materials with moderate absorption, such as various lanthanides. Based on this research, novel multilayers based on Yb, Al, and SiO have been developed with a narrowband performance in the 50–92 nm range. Furthermore, procedures for the design of multi-material multilayers with absorbing materials have been derived, which resulted in multilayers with enhanced reflectance.

The X-ray Kirkpatrick-Baez (KB) imaging experiment with single layer is implemented. Based on the astigmatism aberration and residual geometric aberration of a single mirror, a KB system with 16X mean magnification and approximately 0.45\circ razing incidence angle is designed. The mirrors are deposited with an Ir layer of 20-nm thickness. Au grids backlit by X-ray tube of 8 keV are imaged via the KB system on scintillator charge-coupled device (CCD). In the \pm80 \mum field, resolutions of less than 5 \mum are measured. The result is in good agreement with the simulated imaging.

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-II radiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5 degrees. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.