太赫兹科学与电子信息学报, 2017, 15 (2): 313, 网络出版: 2017-06-06  

双栅无结晶体管阈值电压模型

Threshold voltage model for junctionless double-gate transistors
杨可萌 1,2,*李悦 1,2郭羽涵 1,2王超 1,2郭宇锋 1,2刘陈 1,2
作者单位
1 南京邮电大学 a.电子科学与工程学院
2 b.江苏省射频集成与微组装工程实验室,江苏南京 210023
摘要
无结晶体管是近年来纳米 SOI MOS器件领域的研究热点,相对于传统晶体管具有明显的优势。本文针对全耗尽型无结晶体管,基于二维泊松方程,建立了电势分布解析模型。根据该模型可以得到阈值电压模型。利用建立的解析模型和半导体器件仿真软件 MEDICI,探讨了栅压和器件结构参数对电势分布和阈值电压的影响。该模型简单且与仿真结果吻合良好。
Abstract
Junctionless double-gate transistors which have obvious advantages over traditional junction transistors are becoming a hot topic in the field of nano Silicon-On-Insulator(SOI) devices nowadays. Based on 2-D Poisson equation, an analytical model is derived to calculate potential distribution in the channel. Based on this model, threshold voltage of the junctionless double-gate transistors can be obtained. By using this model and device simulator MEDICI, effects of gate voltage and parameters of device structure on potential distribution and threshold voltage are investigated in detail. This model is simple and has a good match with the simulation results.
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杨可萌, 李悦, 郭羽涵, 王超, 郭宇锋, 刘陈. 双栅无结晶体管阈值电压模型[J]. 太赫兹科学与电子信息学报, 2017, 15(2): 313. YANG Kemeng, LI Yue, GUO Yuhan, WANG Chao, GUO Yufeng, LIU Chen. Threshold voltage model for junctionless double-gate transistors[J]. Journal of terahertz science and electronic information technology, 2017, 15(2): 313.

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